RJ Lee Group, a Pittsburgh-based scientific analysis, consulting, and development firm, announces the upcoming launch of Thermo Fisher Scientific’s K-Alpha X-ray photoelectron spectroscopy (XPS) system in their analytical work. XPS is a surface spectroscopic technique that measures elemental composition within the topmost 2-10 nanometers of a material surface. XPS can also provide important oxidation state and other chemical bonding information for many elements that is not available from other techniques.
Dr. Brian Strohmeier, senior scientist and manager of corporate TEM and optical laboratory operations, gave a clear perspective on the value of the K-Alpha when he said, “The K-Alpha XPS system represents the latest state-of-the-art in photoelectron spectroscopy in terms of total instrument performance and capability range. The instrument was designed to increase both the sample throughput of the surface analysis laboratory and the reliability of the data produced. This helps us solve our client’s most difficult surface-related problems in the most efficient manner.”
In general, the XPS method is a valuable source of information for many different applications, and RJLG scientists rely upon this method to secure highly pragmatic data in numerous areas, including: adhesion failures, corrosion studies, paint defects, coating characterizations, defect and failure analysis, surface and depth profiling, biocompatibility studies, surface contamination identification, surface oxidation studies, and polymer surface characterization.
RJ Lee Group applies the XPS technique to our samples for several reasons, including its ability to provide both qualitative and semi-quantitative results for most elemental analysis, the variety of samples the instrument will accept, the ease of sample preparation, and the nondestructive nature of testing compared to other electron and ion beam surface analysis techniques. This method produces excellent results while reducing the time and costs involved with sampling procedures – allowing RJ Lee Group to pass on valuable savings to our clients.
More specifically, the K-Alpha system brings the importance of XPS up a notch with significant technical enhancements. The compact, fully integrated, and highly automated design of the K-Alpha simplifies operation and improves all aspects of sample analysis and data processing, which results in reduced cost of analysis. The instrument utilizes a monochromatic aluminum K-Alpha X-ray source with variable microfocusing capability (30-400 μm), a high sensitivity electron energy analyzer, and a multi-channel detection system to provide maximum sensitivity for all types of analysis. The K-Alpha is the ideal XPS instrument for all types of solid sample surface analysis such as metals, ceramics, polymers, biological materials, semiconductors, glasses, thin films, and other vacuum-compatible inorganic and organic materials.
RJ Lee Group, first established in 1980 with a core group of five individuals, now has operations in five states and employs approximately 250 people who are committed to the heart of RJ Lee Group- innovation and excellence. Technical consulting and materials characterization forms the baseline of our work, but we also excel in education advancement, software development, technology commercialization, and resource recovery. As a result of our diverse interests and our expertise in materials science, RJ Lee Group is well positioned to identify and pursue new business opportunities as we continue to develop unique approaches to our nation’s biggest scientific and environmental hurdles. To find out more about our best-in class analytical and consulting services, check out the RJ Lee Group Web site at http://www.rjleegroup.com.