AVS 57th International Symposium & Exhibition 2010: Albuquerque, New Mexico


Visit RJ Lee Group’s Brian Strohmeier and John Mastovich at booth 334 at this year’s AVS Symposium and Exhibition in Albuquerque, New Mexico. October 19 – 21,2010.

Our services are based on the highest level of expertise in optical and electron microscopy, surface analysis, analytical instrumentation, and software development. Leading organizations come to RJLG for more than data and information; they come for an innovative approach and technical solutions developed through our commitment to quality, reliability, and customer satisfaction.

Our major materials characterization and nanotechnology methods include: SEM, FESEM, TEM, STEM, XPS, and many other analytical and spectroscopic techniques.

Our current suite of instrumentation includes: Hitachi HD-2300 FESEM/STEM, Hitachi S-5500 FESEM/STEM, FEI Sirion 400 FESEM, Tescan Vega-II SEM, Thermo Scientific K-Alpha XPS, plus many others.

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