Events
October 19, 2010
AVS 57th International Symposium & Exhibition 2010: Albuquerque, New Mexico
Visit RJLG's Brian Strohmeier and John Mastovich at booth 334 at
this year's AVS Symposium and Exhibition in Albuquerque, New
Mexico. October 19 - 21,2010.
Our services are based on the highest level of expertise in optical
and electron microscopy, surface analysis, analytical
instrumentation, and software development. Leading organizations
come to RJLG for more than data and information; they come for an
innovative approach and technical solutions developed through our
commitment to quality, reliability, and customer
satisfaction.
Our major materials characterization and nanotechnology methods
include: SEM, FESEM, TEM, STEM, XPS, and many other analytical and
spectroscopic techniques.
Our current suite of instrumentation includes: Hitachi HD-2300
FESEM/STEM, Hitachi S-5500 FESEM/STEM, FEI Sirion 400 FESEM, Tescan
Vega-II SEM, Thermo Scientific K-Alpha XPS, plus many others.
Follow Us