The American Vacuum Society (AVS) 56th International Symposium and Exhibition has been developed to address cutting-edge issues associated with fundamental and applied vacuum science and technology in both the research and manufacturing communities. Technical subjects covered at the AVS symposium include: biomaterial surfaces and interfaces, high resolution electron microscopy methods, electronics and semiconductor materials, nanotechnology, photovoltaics and other alternative energy research, surface analysis applications and techniques, thin film materials and devices, and the latest discoveries in many other vacuum-related scientific disciplines. This year's conference and exhibition will take place at the San Jose Convention Center in San Jose, CA on November 8-13, 2009.  More than 3,000 scientists, academics, and students from the United States and abroad are expected to attend. 

RJLG will host a booth at the AVS Exhibition to highlight our latest field emission scanning electron microscopy (FESEM) and scanning transmission electron microscopy (STEM) capabilities provided by the Hitachi S-5500 FESEM/STEM and the Hitachi HD-2300A STEM instruments, as well as our state-of-the-art X-ray photoelectron spectroscopy (XPS) capabilities provided by the Thermo Scientific K-Alpha instrument. We will also be displaying the latest Hitachi TM-1000 tabletop SEM instrument in the RJLG booth. Ben Schifelbein, John Mastovich, and Brian Strohmeier will represent RJLG at the AVS exhibition.

RJLG scientists will participate in four technical presentations at this prestigious event (see titles below). Three of the presentations focus on nanotechnology-related applications and the advantages of using a multi-technique (FESEM/STEM plus XPS) approach for providing complementary information and more comprehensive characterization of nanomaterials. The fourth presentation describes new and improved XPS methods for the surface characterization of chromium passivated stainless steel materials that are used for processing in the semiconductor industry.

The titles are below. Find the abstract in Related files below. 

Tuesday, November 10, 3:00-3:20 PM, Room C2: "Nanoparticle Characterization Using Advanced FESEM/STEM and XPS Instrumentation," J. T. Mastovich, K. L. Bunker, T. L. Lersch, J. P. Marquis, Jr., G. S. Casuccio, J. D. Piasecki, and B. R. Strohmeier.

Tuesday, November 10, 6:00 PM, Poster Session, Exhibit Hall 3: "Automated XPS Analysis of Passivated Stainless Steel Based on the SEMI Standard," O. Mustonen, T. S. Nunney, B. R. Strohmeier, J. D. Piasecki, and R. J. Lee.

Wednesday, November 11, 8:20-8:40 AM, Room C1: "XPS and FESEM/STEM Characterization of Silver Nanoparticles Formed from the X-ray-Induced and Thermal Reduction of Silver Behenate," B. R. Strohmeier, K. L. Bunker, C. L. Lopano, J. P. Marquis, Jr., J. D. Piasecki, K. E. Bennethum, R. G. White, T. S. Nunney, and R. J. Lee.

Wednesday, November 11, 10:20-10:40 AM, Exhibit Hall 1: "RJ Lee Group's Advanced FESEM/STEM and XPS Analytical Services for Exploring the Nano-World," B. R. Strohmeier, K. L. Bunker, and J. D. Piasecki.

Visit Dr. Brian Strohmeier, John Mastovich and Ben Schifelbein at booth #632.

For more information visit http://www.avs.org/inside.event.aspx