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Cross-sectional and Plan View TEM Analysis of Thin Film Technologies
RJ Lee Group (RJLG) can aid clients in detecting contaminant particulate resulting from microelectronic processing (nm range). A client was having difficulties enabling their electronically programmable read-only memory (EPROM). RJLG microscopically tested the microelectronics application using cross-sectional and plan view TEM analysis of specific failure locations on the memories. Resistive contacts were formed on the program sequencer. These nickel-chrome links affected the programming modules because there was incomplete fusion. RJLG concluded that the failure resulted from a thin film on a resistor.